The Shim-pack XR-ODSIII with an increased pressure tolerance of 100 MPa can be used for a wider range of applications while maintaining the ease of use of the Shim-pack XR-ODSII. By combining Shim-pack XR-ODSII /III with Prominence UFLC or Nexera, high-resolution and high-sensitivity detection of minute components can be achieved in impurity analysis, etc.